Konstantina Topka, Hugues Vergnes, Tryfon Tsiros, Paris Papavasileiou, Laura Decosterd, et al.. An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine.
Chemical Engineering Journal, Elsevier, 2021, 431, pp.133350.
⟨10.1016/j.cej.2021.133350⟩.
⟨hal-03514135⟩