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Asymmetric Solvent-Annealed Triblock Terpolymer Thick Films Topped by a Hexagonal Perforated Lamellar Nanostructure

Abstract : Asymmetric and nanostructured polystyrene-block-poly(2-vinyl pyridine)-block-poly(ethylene oxide) (PS-b-P2VP-b-PEO or SVEO, S:V:EO ≈ 56:34:10, M ∼ 79.5 kg.mol–1 and Đ ∼ 1.05) thick films blended with 20 wt % of a short PS homopolymer (hPS, M ∼ 10.5 kg.mol–1 and Đ ∼ 1.09) were achieved by combining the non-solvent induced phase separation (NIPS) process with a solvent vapor annealing (SVA) treatment. Here, the NIPS step allows for the formation of a highly-permeable sponge-like substructure topped by a dense thin layer exhibiting poorly-ordered nanopores while the subsequent SVA treatment enables to reconstruct the material top surface into a porous monolayer of well-ordered hexagonal perforated lamellae (HPL). This optimized film architecture generated by NIPS-SVA showed a mean water permeability of 860 L h–1 m–2 bar–1, which is roughly twice time higher than the flux measured through NIPS made PS-b-P2VP-b-PEO/hPS materials having poorly-ordered nanopores. The post-SVA treatment also revealed as a powerful tool to tailor the thickness of the nanostructure formed within the blended material since monoliths entirely composed of a HPL phase were produced by increasing the time of exposure to a chloroform stream. The water flux of such PS-b-P2VP-b-PEO/hPS monoliths was found to be an order of magnitude lower than that of their asymmetric film homologues.
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Contributor : Karim Aissou Connect in order to contact the contributor
Submitted on : Monday, November 8, 2021 - 1:18:31 PM
Last modification on : Friday, August 5, 2022 - 11:01:09 AM
Long-term archiving on: : Wednesday, February 9, 2022 - 7:52:03 PM


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Karim Aissou, Hana Bouzit, Felix Krusch, Jean-Pierre Mericq, Didier Cot, et al.. Asymmetric Solvent-Annealed Triblock Terpolymer Thick Films Topped by a Hexagonal Perforated Lamellar Nanostructure. Macromolecular Rapid Communications, Wiley-VCH Verlag, 2022, 43, pp.2100585. ⟨10.1002/marc.202100585⟩. ⟨hal-03419294⟩



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