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Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach

Thomas Alcaire 1, 2 Delphine Le Cunff 2 Victor Gredy 2 Jean-Herve Tortai 1
1 LTM - Laboratoire des technologies de la microélectronique
2 ST-CROLLES - STMicroelectronics [Crolles]
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Conference papers
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https://hal-cnrs.archives-ouvertes.fr/hal-03017738
Contributor : Jean-Hervé Tortai <>
Submitted on : Saturday, November 21, 2020 - 1:15:48 PM
Last modification on : Tuesday, November 24, 2020 - 4:00:10 PM

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Thomas Alcaire, Delphine Le Cunff, Victor Gredy, Jean-Herve Tortai. Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach. 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), Aug 2020, Saratoga Springs, France. pp.1-6, ⟨10.1109/ASMC49169.2020.9185349⟩. ⟨hal-03017738⟩

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