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Hybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin films
Abstract : Comparison of bandgap determination using ellipsometry and ELS-XPS. • Large energy bandgap difference between the two methods, up to 1.6 eV. • Combination of the two techniques, using a triple Tauc-Lorentz oscillator model. • Robust determination of the bandgap in the SiO 2-Si 3 N 4 system. • Method to measure n and k in a large energy range, from 1.5 up to 30 eV.
https://hal-cnrs.archives-ouvertes.fr/hal-03017737
Contributor : jean-hervé Tortai Connect in order to contact the contributor
Submitted on : Tuesday, December 1, 2020 - 3:12:36 PM
Last modification on : Sunday, June 26, 2022 - 12:31:02 AM
Long-term archiving on: : Tuesday, March 2, 2021 - 6:13:28 PM
Contributor : jean-hervé Tortai Connect in order to contact the contributor
Submitted on : Tuesday, December 1, 2020 - 3:12:36 PM
Last modification on : Sunday, June 26, 2022 - 12:31:02 AM
Long-term archiving on: : Tuesday, March 2, 2021 - 6:13:28 PM