Self-assembly of copper-free maltoheptaose-block-polystyrene nanostructured thin films in real and reciprocal space - Archive ouverte HAL Access content directly
Journal Articles Carbohydrate Polymers Year : 2019

Self-assembly of copper-free maltoheptaose-block-polystyrene nanostructured thin films in real and reciprocal space

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Abstract

The promising carbohydrate-based block copolymer maltoheptaose-block-polystyrene (MH-b-PS) has been used for high-performance memory transistors and next generation nanolithography. In order to realize the potential of MH-b-PS especially in microelectronic applications, we firstly improved its synthetic method for obtaining large amount of copper-free MH-b-PS. The main improvement relies on the removal of the residual copper catalyst by using a chelating resin. Then, the microphase separation of copper-free MH-b-PS in both thin film and bulk states under different solvent vapor annealing conditions were investigated comprehensively and compared with our previous report by using both real-space and reciprocal-space techniques. A phase transition of MH-b-PS from hexagonal close-packed horizontal cylinders to face-centered cubic were observed when increasing the amount of tetrahydrofuran in the mixture annealing solvent of tetrahydrofuran and H2O. More details about self-assembled MH-b-PS nanostructures were analyzed by comparing grazing incidence small angle X-ray scattering patterns with corresponding atomic force microscopy phase images.
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hal-02954596 , version 1 (01-10-2020)

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Yingjie Liao, Laurent Goujon, Eric Reynaud, Sami Halila, Alain Gibaud, et al.. Self-assembly of copper-free maltoheptaose-block-polystyrene nanostructured thin films in real and reciprocal space. Carbohydrate Polymers, 2019, 212, pp.222-228. ⟨10.1016/j.carbpol.2019.02.014⟩. ⟨hal-02954596⟩
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